KOR | CHN

Specialty Gas

C4F6 / WF6
CH2F2
high-purity HF
C3H2F6
C3H2F6
c4f6

C3H2F6
C3H2F6[hexafluoropropane]

· APPLICATION Dry Etching Gas used in semiconductor etching process
· PACKING Cylinder : Cr-mo / Valve : DISS716 /
Filling weight (KG) : 45KG

MSDS Download

· Product Specifications

Classification Unit Standard
Purity % > 99.99
O2 ppm < 5
N2 ppm < 20
OFC ppm < 90
H2O ppm < 15
HF ppm < 0.3
Fe ppb < 5
Ni ppb < 5